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夏奕东
5.0我来评喜爱度
所在大学:南京大学
所在院系:技术学院
所在地区:江苏
所在城市:南京
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夏奕东老师介绍
夏奕东
南京大学材料科学与工程系
脉冲激光沉积实验室
E-mail: xiayd@nju.edu.cn
基本情况:
2007年 - 至今 南京大学 材料科学与工程系 副教授
2005年 - 2007年 南京大学 物理学系 博士后
2000年 - 2005年 南京大学 材料科学与工程系 博士
1996年 - 2000年 南京大学 材料科学与工程系 学士
研究领域:
1) 微波移相器用电场可调电介质薄膜研究
2) 电阻开关存储器用氧化物以及固体电解质材料研究
3) 下一代MOSFET用栅电极材料与高介电常数栅介质材料研究
4) 互连铜材料的微结构研究
近期代表性论文:
1) Conduction behavior change responsible for the resistive switching as investigated by complex impedance spectroscopy
Y.D. Xia, Z.G. Liu, Y. Wang, L. Shi, L. Chen, J. Yin, and X.K. Meng
Applied Physics Letters 91, 102904 (2007)
2) Field-induced resistive switching based on space-charge-limited current
Y.D. Xia, W.Y. He, L. Chen, X.K. Meng, and Z.G. Liu
Applied Physics Letters 90, 022907 (2007)
3) Effects of the substitution of Pb for Ba in (Ba,Sr)TiO3 films on the temperature stability of the tunable properties
Y.D. Xia, C. Cai, X.Y. Zhi, B. Pan, D. Wu, X.K. Meng, and Z.G. Liu
Applied Physics Letters 88, 182909 (2006)
4) Effects of applied electric field during postannealing on the tunable properties of (Ba,Sr)TiO3 thin films
Y.D. Xia, J.B. Chen, B. Pan, D. Wu, X.K. Meng, and Z.G. Liu
Applied Physics Letters 87, 052902 (2005)
5) The kinetics and mechanism of room-temperature microstructural evolution in electroplated copper foils
K.B. Yin, Y.D. Xia, C.Y. Chan, W.Q. Zhang, Q.J. Wang, X.N. Zhao , A.D. Li, Z.G. Liu, M.W. Bayes, K.W. Yee
Scripta Materialia 58, 65 (2008)
6) Nonvolatile memory devices with Cu2S and Cu-Pc bilayered films
L. Chen, Y.D. Xia, X.F. Liang, K.B. Yin, J. Yin, Z.G. Liu, and Y. Chen
Applied Physics Letters 91, 073511 (2007)
7) Thermal stability and electrical properties of titanium-aluminum oxide ultralthin films as high-k gate dielectric materials
L. Shi, Y.D. Xia, B. Xu, J. Yin, and Z.G. Liu
Journal of Applied Physics 101, 034102 (2007)
Yidong Xia
Department of Materials Science and Engineering
Pulsed Laser Deposition Laboratory
E-mail: xiayd@nju.edu.cn
Research Experience:
2007 – present: Associate Professor
Department of Materials Science and Engineering
Nanjing University
2005 – 2007: Postdoctoral Research
Department of Physics
Nanjing University
Education:
2000 – 2005: study for Ph. D
Department of Materials Science and Engineering
Nanjing University
1996 – 2000: study for B.S. degree
Department of Materials Science and Engineering
Nanjing University
Research Field:
1) Tunable dielectric thin films for the applications in microwave phase shifter devices
2) Oxide and solid electrolyte thin films for the applications in resistive switching memory
3) Gate electrode materials and high-k gate dielectrics for the 45 nm node MOSFET applications
4) Microstructure and reliability of electro-plated copper for printed circuit boards applications
Publications:
1) Conduction behavior change responsible for the resistive switching as investigated by complex impedance spectroscopy
Y.D. Xia, Z.G. Liu, Y. Wang, L. Shi, L. Chen, J. Yin, and X.K. Meng
Applied Physics Letters 91, 102904 (2007)
2) Field-induced resistive switching based on space-charge-limited current
Y.D. Xia, W.Y. He, L. Chen, X.K. Meng, and Z.G. Liu
Applied Physics Letters 90, 022907 (2007)
3) Effects of the substitution of Pb for Ba in (Ba,Sr)TiO3 films on the temperature stability of the tunable properties
Y.D. Xia, C. Cai, X.Y. Zhi, B. Pan, D. Wu, X.K. Meng, and Z.G. Liu
Applied Physics Letters 88, 182909 (2006)
4) Effects of applied electric field during postannealing on the tunable properties of (Ba,Sr)TiO3 thin films
Y.D. Xia, J.B. Chen, B. Pan, D. Wu, X.K. Meng, and Z.G. Liu
Applied Physics Letters 87, 052902 (2005)
5) The kinetics and mechanism of room-temperature microstructural evolution in electroplated copper foils
K.B. Yin, Y.D. Xia, C.Y. Chan, W.Q. Zhang, Q.J. Wang, X.N. Zhao , A.D. Li, Z.G. Liu, M.W. Bayes, K.W. Yee
Scripta Materialia 58, 65 (2008)
6) Nonvolatile memory devices with Cu2S and Cu-Pc bilayered films
L. Chen, Y.D. Xia, X.F. Liang, K.B. Yin, J. Yin, Z.G. Liu, and Y. Chen
Applied Physics Letters 91, 073511 (2007)
7) Thermal stability and electrical properties of titanium-aluminum oxide ultralthin films as high-k gate dielectric materials
L. Shi, Y.D. Xia, B. Xu, J. Yin, and Z.G. Liu
Journal of Applied Physics 101, 034102 (2007)
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